MAPPER Litography
Description
On 27 June 2013, the Technical Physics Department of the Royal Institute of Engineers is organising a visit to MAPPER Lithography.
MAPPER Lithography, based in Delft, is developing the next generation of lithography machines for the semiconductor (chip) industry. The core of this machine is based on an innovative and patented system. The system uses glass fibres, which allows more than ten thousand switchable parallel electron beams to be individually controlled and written on an electron-sensitive layer. Huge amounts of data are processed in the process.
MAPPER Lithography was founded in 2000 as a spin-off from TU Delft. Since then, MAPPER has been working on developing 'parallel electron beam writing technology'. Today, MAPPER consists of about 160 people.
Traditionally, the semiconductor industry uses a lithographic machine based on a principle in which a mask containing a pattern is exposed on a silicon wafer. MAPPER's lithography machine does not use masks. This creates a cost advantage. It also gives a high degree of flexibility in developing specific chips for new applications.
This visit will focus on Physics. If you would like to read more about MAPPER, please visit the website: www.mapperlithography.com and a video about the technology MAPPER is developing at: www.mappertechnology.com/technology/mapper-technology
Participants are requested to be present no later than 14:15.
Afterwards, there will be an opportunity to talk afterwards over a drink
Location
Computerlaan 15, 2628 XK Delft
Organiser
Technical Physics
Name and contact details for information
Coen Groen