Description

This symposium is intended for all engineers interested in the development of nanostructures in the chip industry. There are two lectures of 45 minutes each that will cover the role of lithography in the production of nanoscale structures for chips. Martin van den Brink (ASML) will give an overview of the application of light and in particular the use of extreme ultraviolet (13.6 nm). Erwin Slot (Mapper) will contribute on the use of very many, separately controllable electron beams for nanoscale lithography. The importance of the metrology community's ability to provide effective standards at the nanometre level will be highlighted in a third lecture by Marijn van Veghel (NMI).

The venue chosen for this symposium is Hotel Breukelen, which is about 100 metres from Breukelen railway station. Trains arrive four times an hour from Amsterdam, and Utrecht and twice an hour from Rotterdam.

If there is sufficient interest, a joint meal will be organised.

We also invite you to attend the members' annual meeting prior to the mini-symposium.
The meeting will start at 17.00 and will also take place at Hotel Breukelen. The documents for this can also be found in the attached venue.

Location

Hotel Breukelen in Breukelen

Organiser

Technical Physics

Name and contact details for information

Further information from Elfride Dijksta at the e-mail address below or by phone: 053 - 4894097.

kiviniria@utwente.nl